High-Q Ultrasensitive Spiral-Based Coupled-Resonator Device on a Si3N4 Platform for Sensing Applications

Xi Wu,Tianren Fan,Ali A. Eftekhar,Amir H. Hosseinnia,Ali Adibi

High-Q Ultrasensitive Spiral-Based Coupled-Resonator Device on a Si3N4 Platform for Sensing Applications

2020

Xi Wu
Tianren Fan
Ali A. Eftekhar
Amir H. Hosseinnia
Ali Adibi

We report high-Q ultrasensitive Si3N4 racetrack-spiral and spiral-spiral coupled-resonator devices with bulk sensitivity of 132 nm/RIU for sensing applications. We demonstrate Qs of 560,000 (263,000) at ~1300 nm wavelength with air (water) cladding.

Keywords:

Chemical vapor deposition
Resonator
Optoelectronics
Cladding (metalworking)
sensing applications
Refractive index
Scanning electron microscope
Materials science
Spiral
Wavelength

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