Reaction Pathways for Atomic Layer Deposition with Lithium Hexamethyl Disilazide, Trimethyl Phosphate, and Oxygen Plasma
2020
Atomic layer deposition (ALD) of lithium-containing films is of interest for the development of next-generation energy storage devices. Lithium hexamethyl disilazide (LiHMDS) is an established prec...
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
28
References
2
Citations
NaN
KQI