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Hydrogen diffusion in PECVD stack layer of silicon oxide and hydrogenated amorphous silicon nitride
Hydrogen diffusion in PECVD stack layer of silicon oxide and hydrogenated amorphous silicon nitride
2011
S. A. Strola
M. S. Hanssen
M. Mandoc
R. Mary Joy
L. Gautero
M. G. Hussein
R. C. M. Bosch
Franciscus Cornelius Dings
W.M.M. Kessels
M. M. C. van de Sanden
Keywords:
Amorphous silicon
Hydrogen
Oxide thin-film transistor
Metallurgy
Plasma-enhanced chemical vapor deposition
Nitride
LOCOS
Nanocrystalline silicon
Silicon oxide
Materials science
Inorganic chemistry
Optoelectronics
amorphous silicon nitride
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