Evaluation of Easily Removable Pellicle Adhesive
2010
With the advancement of technology, the need to produce flatter photomasks is critical to
meet strict mask manufacturing requirements. Components such as pellicle mounting
techniques, pellicle frame height, frame material and adhesive all play an important role
in finished photomask flatness.1-5 In particular, recent studies have shown that adhesive
flexibility affect final photomask flatness significantly.6 This has motivated pellicle
suppliers to optimize adhesive properties in addition to evaluate new adhesives.
The paper describes the joint evaluations between IBM, Toppan and MLI, performed to
determine the effect of a new MLI adhesive on the distortion of photomasks. Due to the
nature of this adhesive, minimal mounting force is required. As a result of utilizing
extreme low mounting pressure, benefits such as decreased flatness distortion and ease of
adhesive removal are observed. The goal of this paper is to evaluate this new adhesive
offering and understand the various impacts it has on pelliclized photomasks for
advanced technologies.
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