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Analysis of the composition of tantalum nitride in CMOS metallization trenches using parallel angle‐resolved XPS
Analysis of the composition of tantalum nitride in CMOS metallization trenches using parallel angle‐resolved XPS
2020
Bettina Wehring
Lukas Gerlich
Alireza M. Kia
Marcus Wislicenus
Benjamin Uhlig
Keywords:
X-ray photoelectron spectroscopy
Optoelectronics
CMOS
Materials science
Tantalum nitride
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