Preparation method for array substrate, array substrate and display apparatus

The invention discloses a preparation method for an array substrate, an array substrate and a display apparatus, and aims at increasing the etching speed of a first electrode layer in the array substrate and improving the aperture ration of the display apparatus. The preparation method comprises steps of sequentially depositing a first electrode layer and a grid metal layer in a substrate, wherein the first electrode layer comprises at least two conductive layers, and the etching rates of formation materials of the at least two conductive layers are different; forming a photoresist layer on the grid metal layer; exposing the substrate where the photoresist layer, the first electrode layer and the grid metal layer are formed using a halftone masking plate; performing first etching of the grid metal layer; etching the first electrode layer; and ashing the photoresist layer, performing second etching of the grid metal layer, peeling the residual photoresist, and forming a semiconductor layer, a source, a drain electrode layer, a through hole and a second electrode layer on the grid metal layer subjected to the second etching in sequence.