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PECVD法制备SiO 2 薄膜致密性的特性
PECVD法制备SiO 2 薄膜致密性的特性
2016
Xiaohe Ping
Rujian Sun
Xiangzhu Ma
Kai Yang
Shuangxiang Zhang
Keywords:
Thin film
Combustion chemical vapor deposition
Plasma processing
Plasma-enhanced chemical vapor deposition
Carbon film
Materials science
Inorganic chemistry
Physics
Optoelectronics
Compact space
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