Device for correction of ametropia

PURPOSE: To improve the accuracy in correcting ametropia by using a mask with cut-off slits and changing the wave length of ultraviolet rays. CONSTITUTION: This device for correction of ametropia consists of an ultraviolet laser pulse generator 4 operated with 223nm wavelength, an even optical beam generator 5 optically connected to the laser pulse generator 4, a drive device 7 to drive the optical beam generator to rotate, and a mask 6 with cut-off slits attached at the optical output pat 8 of the beam generator 5. The mask has at least more than one petal-shaped slit, whose shape is same as a first petal. Because of the shape, irradiated ultraviolet rays can be evenly and symmetrically distributed on a cornea by rotating the mask with cut-off slits. By the optical output 9 of the mask 6 with cut-off slits, a means 10 for forming an image of the mask 6 with cut-off slits on the surface 1 of the cornea 2 of an eye 11 to be examined is exposed. COPYRIGHT: (C)1990,JPO