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Integration of Al Segregated NiSiGe/SiGe Source/Drain Contact Technology in p-FinFETs for Drive Current Enhancement
Integration of Al Segregated NiSiGe/SiGe Source/Drain Contact Technology in p-FinFETs for Drive Current Enhancement
2009
Mantavya Sinha
Rinus T. P. Lee
Sivasubramaniam Nandini Devi
Guo-Qiang Lo
Eng Fong Chor
Yee Chia Yeo
Keywords:
Materials science
Electronic engineering
Engineering physics
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