CVD growth of InGaN nanowires

Abstract In this paper, the chemical vapor deposition (CVD) growth of InGaN nanowires was systematically studied. The catalyst was Au and the starting materials were Ga, In and NH 3 . The samples were characterized with scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), transmission electron spectroscopy (TEM), and X-ray diffraction (XRD), etc. The influence of the growth temperatures, Au thicknesses, gas flowrates and Ga and In amount on the morphology and properties of InGaN nanowires was investigated. It is found that 600 °C is a suitable growth temperature. On the substrate with Au thickness of 150 A, helical InGaN nanowires are obtained. The change of NH 3 partial pressure and Au thickness will result in the morphology change of the samples. An increase of Ga results in shorter InGaN nanowires while an increase of In amount will lead to longer InGaN nanowires. The morphology will also change when both the amount of In and Ga were increased or reduced without changing the ratio of Ga to In.