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Strong Acid- and Alkari-Resistant Ta 2 O 5 -ZrO 2 Films Prepared by Low Pressure MOCVD
Strong Acid- and Alkari-Resistant Ta 2 O 5 -ZrO 2 Films Prepared by Low Pressure MOCVD
1992
Kohei Amano
Katsuhisa Sugimoto
Keywords:
Metalorganic vapour phase epitaxy
Inorganic chemistry
Materials science
Chemical engineering
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