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Evaluation of Next Generation Fluids for ArF Immersion Lithography Beyond Water
Evaluation of Next Generation Fluids for ArF Immersion Lithography Beyond Water
2007
Hoang Tran
Roger H. French
Douglas J. Adelman
Jerald Feldman
Weiming Qiu
Robert Clayton Wheland
Luke W. Brubaker
Brian E. Fischel
Barbara Bobik Fones
Michael F. Lemon
Min K. Yang
Osami Nagao
Mureo Kaku
Michael T. Mocella
John J. Schmieg
Keywords:
Numerical aperture
Refractive index
Immersion lithography
Indexation
Optics
Materials science
Analytical chemistry
Absorbance
Nanotechnology
fluid handling
Photochemistry
particle contamination
Correction
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