Reactive ion etching of nanocrystalline diamond for the fabrication of one-dimensional nanopillars

Abstract One-dimensional diamond nanostructures (diamond nanopillars) have been fabricated using nanocrystalline diamond films (NCD) as a starting material, and electron beam lithography (EBL) and reactive ion etching in an inductively coupled O 2 plasma (ICP-RIE) as processing techniques. In a first step, the etch rates have been determined as a function of four major plasma parameters, namely the ICP power, the rf power applied to the substrate holder, the pressure, and the oxygen flow rate. These parameters have been varied in wide ranges. In order to get insight into the mechanisms of the etching process, etching experiments have been performed with unpatterned NCD films by varying the process times using rather short intervals. Finally, EBL has been applied prior to the etching to obtain one-dimensional pillars with diameters from 200 nm to 1 μm. Scanning electron microscopy has been employed to characterize the pillars. First results showed the process developed to be successful, and first examples will be presented.