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Atomic layer deposited barriers for copper interconnects
Atomic layer deposited barriers for copper interconnects
2004
Jörg Schuhmacher
Ana Martin Hoyas
Didem Ernur
Zsolt Tokei
Youssef Travaly
Christophe Bruynseraede
Alessandra Satta
Caroline Whelan
Denis Shamiryan
Gerald Beyer
Thomas Abell
Victor Sutcliffe
Marc Schaekers
Karen Maex
Keywords:
Copper
Metallurgy
Ceramic materials
Materials science
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