New tools to enable photomask repair to the 32nm node
2009
The AFM-technology based technique of nanomachining has been well-proven in the area photomask repair since
its introduction a decade ago. However, the problems and challenges facing the mask repair operator have
changed significantly in this period, and ongoing engineering platform development has reflected these shifts, as
well as refinements based on specialized experience with nanomachining repair technology. Improvements from
this technical development include improved monitoring and control of the internal tool environment (to minimize
AFM scan noise and thermal drift), and automation to easily and reliably clean and characterize the 3-dimensional
shape of the NanoBit TM apex. For repair applications, improvements will be shown for the automated and
operator-intuitive reconstruction of 3-dimensional nanometer-scale patterns on the photomask with referenced
z-depth and xy alignment regardless of pattern orthogonality. Multiple pattern repair capability is also reviewed
due to a greater diversity of available process options and multi-repair box capability with a common quartz-level
z-reference point. Finally, it will be shown how all of these individual improvements work together to provide
extended repair capability down to the 32 nm technology node.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
3
References
2
Citations
NaN
KQI