Design and fabrication of multilayer dielectric film for combination device spatial filter

Abstract Spatial low-pass filters are of great importance to high-power laser systems. Different from the conventional multilayer dielectric film spatial filter device that consists of single component, a combination device of spatial filter that includes multiple film components is more appealing due to its higher laser-induced damage threshold. A novel multilayer dielectric film used for combination device spatial filter is presented in this paper. The sensitivity of the multilayer dielectric film was analyzed, and the main studies are given to the design, fabrication and performance analysis of cutoff filter-combination device. The laser-induced damage threshold of the multilayer dielectric films was tested. It is anticipated that the combination of two cutoff filters can be applied in practical applications of devices of high-power laser systems.