Holographic vertical-cavity surface-emitting laser

Summary form only given. We present holographic diffraction from a broad-area thin-film holographic laser. The holographic laser is similar to a vertical-cavity surface-emitting laser (VCSEL) and consists of a 1 /spl mu/m thick GaAs active layer sandwiched between two 61.6 nm Al/sub 0.1/Ga/sub 0.9/As-AlAs 72.8 nm Bragg stacks, centered at 870 nm, with top and bottom periods of 5 and 10, respectively. No post-growth processing or fabrication is required.