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Cyclic C4F8 and O2 plasma etching of TiO2 for high-aspect-ratio three-dimensional devices
Cyclic C4F8 and O2 plasma etching of TiO2 for high-aspect-ratio three-dimensional devices
2021
Tsubasa Imamura
Itsuko Sakai
Hisataka Hayashi
Makoto Sekine
Masaru Hori
Keywords:
Optoelectronics
Etching
Materials science
o2 plasma
Aspect ratio (aeronautics)
Correction
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