Application of pyrosol deposition process for large-area deposition of fluorine-doped tin dioxide thin films

Abstract We report on a pyrosol deposition process used for depositing on large-area (up to 100 cm long and 30 cm wide) soda-lime glass substrates of varying thickness (between 0.3 and 6 mm). Fluorine-doped tin oxide (SnO 2 :F) films were deposited on glass coated with a diffusion barrier of Al 2 O 3 . The film deposition was homogenous and film properties were similar to those reported for films deposited by chemical vapour deposition. A minimum resistivity of 5 × 10 −4 ohms cm, carrier mobility of 20 cm 2 V −1 s −1 and optical transmission >80% for typical SnO 2 :F films 3000 A thick were achieved. Micrographs obtained by scanning electron microscopy of some typical films presented here demonstrate fairly good crystalline structure.