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Etched Profile Control of the Multi-Layer Oxide/Poly-Si Stack Using Pulsed Plasma for 3D VG NAND Application
Etched Profile Control of the Multi-Layer Oxide/Poly-Si Stack Using Pulsed Plasma for 3D VG NAND Application
2013
Fang Hao Hsu
Zusing Yang
Hong-Ji Lee
Nan-Tzu Lian
Tahone Yang
Kuang Chao Chen
Chih-Yuan Lu
Keywords:
Oxide
Plasma
NAND gate
Electronic engineering
Analytical chemistry
Materials science
Optoelectronics
multi layer
Correction
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