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Theoretical modeling of laser-produced plasmas for development of extreme UV radiation source for lithography
Theoretical modeling of laser-produced plasmas for development of extreme UV radiation source for lithography
2004
K. Nishihara
Takeshi Nishikawa
Akira Sasaki
Toru Kawamura
A. Sunahara
Hiromitsu Furukawa
M. Murakami
H. Nishimura
Yoshinori Shimada
M. Nakai
S. Fujioka
Keisuke Shigemori
S. Uchida
Kazumi Fujima
Richard M. More
Fumihiro Koike
Takashi Kagawa
V. Zhakhovskii
Kimio Hashimoto
Michiteru Yamaura
R. Matsui
Takahiro Hibino
Tomohisa Okuno
Y. Tao
F.L. Sohnatzadeh
Keiji Nagai
T. Norimatsu
H. Tanuma
N. Miyanaga
Y. Izawa
Keywords:
Laser
Extreme ultraviolet
Plasma
Radiation
Lithography
Optoelectronics
Extreme ultraviolet lithography
Optics
Materials science
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