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Response surface study of inductively coupled plasma etching of GaAs/AlGaAs in BCl[sub 3]/Cl[sub 2]
Response surface study of inductively coupled plasma etching of GaAs/AlGaAs in BCl[sub 3]/Cl[sub 2]
1999
S. Agarwala
Oliver King
Scott C. Horst
Richard E. Wilson
D. Stone
Mario Dagenais
Yanli Chen
Keywords:
Inductively coupled plasma
Analytical chemistry
Chemistry
Inorganic chemistry
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