Effect of high-temperature post-deposition annealing on cesium lead bromide thin films deposited by vacuum evaporation

Ayuki Murata,Tatsuya Nishimura,Hirofumi Shimizu,Yuta Shiratori,Takuya Kato,Ryousuke Ishikawa,Shinsuke Miyajima

Effect of high-temperature post-deposition annealing on cesium lead bromide thin films deposited by vacuum evaporation

2020

Ayuki Murata
Tatsuya Nishimura
Hirofumi Shimizu
Yuta Shiratori
Takuya Kato
Ryousuke Ishikawa
Shinsuke Miyajima

The effects of high-temperature (500 °C) post-deposition annealing (PDA) on the properties of cesium lead bromide (CsPbBr3) films deposited by vacuum evaporation were studied. The PDA effectively i...

Keywords:

Condensed matter physics
Caesium
Vacuum evaporation
Deposition (law)
Thin film
Annealing (metallurgy)
Chemistry
Analytical chemistry
Lead bromide

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