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Plasma Damage Impact in 0.25 um Dual-Gate Technology
Plasma Damage Impact in 0.25 um Dual-Gate Technology
2000
G. Ghidini
F Pellizzer
N. Galbiati
Daniela Brazzelli
D. Peschiaroli
L. Brusaferri
Keywords:
Capacitor
Materials science
Plasma
Annealing (metallurgy)
Electronic engineering
Analytical chemistry
Conductivity
electric breakdown
dual gate
Degradation (geology)
Correction
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