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CVD Characteristics and Mechanism of a-Si:H thin Films in Electron Cyclotron Resonance H2-Ar-SiH4 Plasma
CVD Characteristics and Mechanism of a-Si:H thin Films in Electron Cyclotron Resonance H2-Ar-SiH4 Plasma
2014
Li Cheng Hu
C. J. Wang
Y. W. Lin
T.-C. Wei
Chien-Chieh Lee
Jenq-Yang Chang
I-Chen Chen
Tomi T. Li
Keywords:
Thin film
Plasma
Electron cyclotron resonance
Nuclear magnetic resonance
Materials science
Atomic physics
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