Prekonzentrator for adsorbing and / or desorbing at least one component of a gas

The invention relates to a microstructure (12) for adsorbing and / or desorbing least one gas component of the microstructure (12) supplied gas comprising a semiconductor substrate (14) having a bottom (16) and a top (18), wherein a plurality (of microchannels 20) which extend respectively (from the bottom 16) for the top (18) of the semiconductor substrate (14), wherein a surface (22) of the respective micro-channels (20) for adsorbing and / or desorbing the at least one gas component flows through the gas is formed by the respective micro-channels (20).