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High Volume Industrial PECVD System for In-Line Deposition of SiN:H on Solar Wafers
High Volume Industrial PECVD System for In-Line Deposition of SiN:H on Solar Wafers
2009
P. Fath
Harald Wanka
Roland Dahl
J. Rehli
T. Rechtsteiner
M. Stroisch
J.-U. Fuchs
Moritz Heintze
Keywords:
Silicon nitride
Analytical chemistry
Wafer
Plasma-enhanced chemical vapor deposition
Materials science
Optoelectronics
Deposition (law)
Correction
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