Method of manufacturing oriented carbon nanotubes

When producing an oriented carbon nanotube by plasma CVD, to provide a method for increasing the growth rate of carbon nanotube. Substrate comprising under flow of a gas as a raw material for carbon nanotubes, the antenna 6 provided in the processing chamber 2 depressurized to generate a plasma, and a reaction-preventing layer formed on the substrate and the catalyst material layer 9, 15 and to generating region 7 of the plasma, along with may avoid ion attacks by-produced radicals, held at a distance radicals can reach. The tip 6a of the antenna 6 is controlled so as to coincide with the position of the antinodes of the standing wave 27 in a microwave.