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Bismuth Resists for EUV Lithography
Bismuth Resists for EUV Lithography
2014
James Passarelli
Miriam Sortland
Ryan Del Re
Brian Cardineau
Chandra Sarma
Daniel A. Freedman
Robert L. Brainard
Keywords:
Photochemistry
Photoresist
Bismuth
Resist
Extreme ultraviolet lithography
Inorganic chemistry
Materials science
Nanotechnology
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