Method for manufacturing display panel substrate

Provided is a method for manufacturing a display panel substrate equipped with semiconductor elements, the method including a film forming step for forming a thin film, a resist film forming step for forming a positive resist film on the thin film, a first exposure step for selectively exposing a portion of the resist film via a photomask having a pattern that corresponds to the pattern of the semiconductor elements, a second exposure step for selectively exposing a portion of the resist film by irradiating the resist film with light while scanning the resist film with the light along the contour shape of the display panel substrate, a developing step for removing areas of the resist film exposed in the first exposure step and the second exposure step and forming a resist pattern on the thin film by developing the resist film, an etching step for selectively removing a portion of the thin film and forming a thin-film pattern by using the resist pattern as a mask and etching the thin film, and a peeling step for peeling off the resist pattern.