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65nm-node Low-Standby-Power FETs with HfAlOx Gate Dielectric
65nm-node Low-Standby-Power FETs with HfAlOx Gate Dielectric
2004
Hiroshi Ohji
Kazuyoshi Torii
Takaaki Kawahara
Takeshi Maeda
Hiroyuki Itoh
A. Mutoh
Riichiro Mitsuhashi
Atsushi Horiuchi
Hiroshi Kitajima
Fumio Ootsuka
Mitsuo Yasuhira
Tsunetoshi Arikado
Keywords:
Standby power
Nanotechnology
Gate dielectric
Electronic engineering
Materials science
Optoelectronics
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