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Impact of Channel Flattening Process on Device Performance of Ge nMOSFETs with Different Surface Orientations
Impact of Channel Flattening Process on Device Performance of Ge nMOSFETs with Different Surface Orientations
2019
Wen Hsin Chang
T. Irisawa
W. Mizubayashi
H. Ishii
N. Uchida
T. Maeda
Keywords:
Communication channel
surface
Optoelectronics
Process (computing)
Flattening
Materials science
Correction
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