Influencia del sustrato, espesor de la capa y técnica de depósito en la textura cristalográfica de películas delgadas de TiN

This paper presents results on the deposition of TiN coatings on metallic substrates (Steel AISI M2 and AISI 304) by various techniques such as physical vapour deposition, Magnetron Sputtering and Ion Platting. In order to identify the phases present, as well as the crystalline structure, the crystallographic texture, and the lattice parameters of the coatings, X-ray diffraction at low incidence angle was used. The thickness of the coatings was estimated by image analysis of micrograph obtained by means of Scanning Electron Microscopy. The TiN coatings obtained by Magnetron Sputtering exhibited a preferential orientation for the crystalline reflection (200) and this is in agreement with the literature. This particular plane has the lowest superficial energy. Conversely the TiN coatings produced by Ion Platting showed a high crystallographic texture in relation to the crystalline reflection (111) which has lower elastic deformation energy. For the coatings deposited on AISI 304 steel, the intensity on plane 200 appeared to increase with increasing coating thickness. However this was not the case for the coatings deposited on AISI M2 steel.