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Dry Etch Process Effects on Cu/low-k Dielectric Reliability for Advanced CMOS Technologies
Dry Etch Process Effects on Cu/low-k Dielectric Reliability for Advanced CMOS Technologies
2011
Junqing Zhou
Wu Sun
Haiyang Zhang
Min-Da Hu
Fan Li
Xing-Hua Song
Shih-Mou Chang
Kwok-Fung Lee
Keywords:
Dry etching
CMOS
Electronic engineering
Low-k dielectric
Materials science
Optoelectronics
Correction
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