De Haas-van Alphen effect in CeTl3CeTl3 under pressure

We report the pressure dependence of electrical resistivity and de Haas-van Alphen effect in an antiferromagnet CeTl3CeTl3. With increasing pressure the Neel temperature TNTN decreases monotonically and both ρ0ρ0 and A values of the resistivity ρ=ρ0+AT2ρ=ρ0+AT2 in the Fermi liquid relation increase, reflecting the approach to the quantum critical point. The critical pressure PcPc is estimated to be about 6 GPa. The cyclotron effective masses also increase with increasing pressure.