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Reduction in surface roughness of SIMOX substrate by H2 annealing
Reduction in surface roughness of SIMOX substrate by H2 annealing
1996
Yasuharu Kunii
S. Nanashima
Masao Nagase
Kiyoshi Izumi
Keywords:
Theoretical computer science
Dielectric
Surface roughness
Substrate (chemistry)
Analytical chemistry
Atomic force microscopy
Annealing (metallurgy)
Epitaxy
Computer science
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