Irregular Increase inSheet Resistance ofNiSilicides atTemperature Rangeof Transition fromNiSitoNiSi2

NiSiisapromising material onsalicide process. However, thethermal stability ofNiSiisstill a significant problem. Degradation insheet resistance of Nisilicide isoriginated fromphase transition from NiSitoNiSi2 and/or agglomeration ofthesilicide layers. We noticed thephenomenon thatthesheet resistance increased irregularly atthetemperature region forthephasetransition, thatis,thepeak characteristics appeared inthetransformation curve of sheet resistance. Inthis work, condition ofgenerating thehighresistance state wasrevealed bychanging temperature, ramping rateandduration timeinthe silicidation process.