Microanalysis of masklessly MeV-ion-implanted area by MeV heavy-ion microprobe
1992
Abstract Maskless MeV ion implantation into a silicon substrate and in-situ microanalysis before and after ion implantation by Rutherford backscattering spectrometry (RBS) or secondary electron (SE) detection using a heavy-ion microprobe were performed. The usefulness of the heavy-ion microprobe for microanalysis was shown.
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