Microanalysis of masklessly MeV-ion-implanted area by MeV heavy-ion microprobe

Abstract Maskless MeV ion implantation into a silicon substrate and in-situ microanalysis before and after ion implantation by Rutherford backscattering spectrometry (RBS) or secondary electron (SE) detection using a heavy-ion microprobe were performed. The usefulness of the heavy-ion microprobe for microanalysis was shown.