The effect of substrate bias voltage on the electrochemical corrosion behaviors of thin film deposited on stainless steel by r. f magnetron sputtering

Anticorrosion TiO2 films were deposited by reactive r.f. magnetron sputtering method, on stainless steel substrates. The effect of bias voltage on the electrochemical corrosion behaviors was investigated. The microstructure of titanium dioxide thin films was analyzed by optical microscope (OM) and X-ray powder diffraction (XRD). Electrochemical corrosion behavior of the thin film was mainly investigated by potentiodynamic polarization in simulated marine environment aqueous NaCl solution at room temperature. The results indicated that the corrosion potential of TiO2 thin film increased and the corrosion current density decreased, which corresponded to a decreased corrosion rate. Results showed that TiO2 thin films improve the corrosion resistance in 3.5% NaCl of the stainless steel surface.