Fabrication of Two Dimensional Carbon Nanostructures using Hot Wire Chemical Vapor Deposition Technique

Two dimensional carbon nanostructures (carbon nanosheets) are fabricated using Hot Wire Chemical Vapor Deposition (HWCVD) technique assisted by H radical injection, using CH 4 as source gas. Carbon nanosheets are grown on crystalline Si(100) wafer as well as on corning glass substrate without using catalyst. The grown carbon nanosheets are aligned vertically on the substrate with thickness in the range of 10-20 nm and about 60-80 nm in height.