Si Surface Preparation with Si Beam Irradiation on the Growth of III-V on Si

The preliminary results of the effects of the Si beam irradiation for the Si surface preparation on the growth of GaAs on Si by MBE are reported. The effects are combined with thermal cyclic anneal (TCA). A slight improvement in the crystalline quality is observed on the photoluminescence spectra of the films grown with Si irradiation, In experimental conditions, Si irradiation during the Si surface preparation has not indicated large effects on the FWHM of XRD. It is also indicated that initial substrate surface treatment affects the quality of thicker film through TCA treatment. Higher substrate temperature during Si beam irradiation is expected to indicate positive Si beam irradiation effects.