Temporal profile of optical transmission probe for pulsed-laser heating of amorphous silicon films

The transient temperature field development during heating of an amorphous silicon (a‐Si) film, deposited on a fused quartz substrate by pulsed excimer laser irradiation is studied. Experimental optical transmission data are compared with heat transfer modeling results. The temperature‐dependence of the material complex refractive index through the thin film thickness is taken into account.