Preparation and characterization of TiN–Ag nanocomposite films

Abstract Thin nanostructured films of TiN–Ag are deposited by a plasma vapour process consisting of co-sputtering of Ti and Ag from three magnetrons in an Ar–N 2 gas mixture. The coatings are characterized by in situ photoelectron spectroscopy, energy-filtered transmission electron microscopy and scanning electron microscopy. The dependence of the film structure and silver cluster distribution on total silver content, substrate biasing and substrate temperature was investigated.