Vapor deposition apparatus and a deposition method

PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus and a vapor deposition method the directly or locally raising the temperature of one surface of a processed object in contact with a processing space when vapor-depositing a film on the processed body in the atmosphere.SOLUTION: A vapor deposition apparatus for a film on a processing body held in the atmosphere comprises: a chamber section 200 arranged in the atmosphere; a source supply line 311 made open on one side of an inner peripheral surface of a processing hole formed in one surface of the chamber section; a first exhaust line 511 made open while wound outside the processing hole 230 on the one surface of the chamber section; a purge gas supply line 321 made open while wound outside the first exhaust line on the one surface of the chamber section; a second exhaust line 521 made open while wound outside the purge gass supply line on the one surface of the chamber section; and a temperature-raised gas supply line 411 made open obliquely to overlap with a part of an inner peripheral surface of the processing hole on the one surface of the chamber section.SELECTED DRAWING: Figure 4