Photoreflectance surface characterization of InP:Fe substrates

Photoreflectance (PR) was used to determine the surface damage caused by polishing on semi-insulating lnP:Fe substrates. PR measurements were performed between subsequent etching steps. The PR results on substrates, obtained from various vendors and laboratories, indicate that the exciton structure near the fundamental absorption edge transition is very sensitive to surface imperfections and the bulk resistivity of the substrates.