The AES and EELS study of thin alumina films deposited on niobium

Abstract The polycrystalline niobium was used as a substrate for thin alumina films deposition. A special Knudsen cell was constructed for this purpose. The atomic purity of both the substrate and the deposited film was controlled by Auger Electron Spectroscopy (AES) and Electron Energy Loss Spectroscopy (EELS). The evaporated films were compared with the clean stoichiometric α-AI 2 O 3 with (11 20) surface orientation. Although alumina depositions were carried out with different evaporation rates we have observed no traces of dissociation of the alumina or the deposition of undesirable atoms on the investigated surface.