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”Erosion behavior of Y2O3 in fluorine based etching plasmas: Orientation dependency and reaction layer formation”
”Erosion behavior of Y2O3 in fluorine based etching plasmas: Orientation dependency and reaction layer formation”
2020
M. Kindelmann
M. Stamminger
Nino Schön
Marcin Rasinski
Rüdiger-A. Eichel
Florian Hausen
Martin Bram
Olivier Guillon
Keywords:
reaction layer
Plasma
Erosion
Fluorine
Etching
Materials science
Chemical engineering
Correction
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