Imprinting Atomic and Molecular Patterns

Abstract The process of Molecular Scale Imprinting (MSI) is described. The method comprises first self-assembly of molecular patterns on semiconductor or metals surfaces, and second localized atomic or molecular reactions activated by heat, light or electrons in order to imprint the pattern. Control of the molecular imprinting stage requires understanding of the molecular reactions discussed in this chapter; single and double dissociative attachment, cooperative reactions, chain reactions and long-range recoil reactions.