Old Web
English
Sign In
Acemap
>
Paper
>
Designing A- b -(B- r -C) block copolymers for lithographic applications
Designing A- b -(B- r -C) block copolymers for lithographic applications
2021
Yuba Raj Dahal
Hongbo Feng
Juan J. de Pablo
Paul F. Nealey
R. Joseph Kline
Debra Audus
Keywords:
Materials science
Lithography
Chemical engineering
Copolymer
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]