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Etching new IC materials for memory devices
Etching new IC materials for memory devices
1998
Kapila Wijekoon
R. Lin
Boris Fishkin
S. Yang
F. Redeker
G. Amico
Savitha Nanjangud
Keywords:
Electronic engineering
Etching
Plasma etching
Integrated circuit
Chemical-mechanical planarization
Materials science
Titanio
Tin
Titanium
Nanotechnology
Binary compound
Tungsten
Correction
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